| Submission Deadline | Notification of Acceptance | Submission Email | Download |
|---|---|---|---|
| June 19, 2026 | 7-20 workdays | [email protected] | Manuscript Template |
Dr. Shuxia Zhao
Associate Professor in Dalian University of Technology
Personal Bio
Dr. Shuxia Zhao obtained her Bachelor and Master degrees from the Hebei Normal University within the years of 2000-2007, and her PhD from the Dalian University of Technology within the years of 2007-2010. Then, she went to the University of Antwerp, Belgium for the Post-doc working experience within the years of 2010-2012, and later on she returned to the Dalian University of Technology, working formally as a teacher and meanwhile a scientific researcher. Before the formal employment, she sequentially investigated the nitrogen parallel plate and hollow cathode discharges with the particle-in-cell and Monte Carlo simulation, the E-to-H mode transition and hysteresis of argon inductively coupled plasma with both the fluid and hybrid models, and the fluorocarbon plasma and its etching mechanisms based on silicon material wafer. She is now engaged in the numerical simulation and theoretical analysis of discharge structure hierarchy of electronegative and radio frequency inductively coupled plasma. The hierarchy presently discovered includes the stratification, parabola and ellipse profiles of ion density, double layer, acoustic ionic vibration, blue sheath, ionization instability, and different types of mass and energy self-coagulations, e.g., ambi-polar type, chemical type, and thermal conductive type. This detailed discharge hierarchy helps people deep recognize the plasma source and possibly open new fields for its applications, such as free nuclear fusion based on the self-coagulation and compressible heating mechanisms.